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환영합니다 Shaanxi KeGu New Material Technology Co., Ltd
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품질 산업용 전기로를 위한 고산화 저항 및 맞춤형 크기의 1600°C 최대 온도 실리콘 카바이드 발열체 공장

산업용 전기로를 위한 고산화 저항 및 맞춤형 크기의 1600°C 최대 온도 실리콘 카바이드 발열체

1600°C Silicon Carbide (SiC) Heating Elements for Industrial Furnaces & Kilns High-Performance Silicon Carbide (SiC) Heating Elements for Industrial Furnaces Our Silicon Carbide (SiC) heating elements represent the pinnacle of high-temperature ceramic heating technology. Manufactured from high-purity, six-party green SiC powder, they are recrystallized at extreme temperatures up to 2200°C to achieve exceptional structural integrity and performance. Engineered for Extreme

품질 실리콘 탄화물 트레이 & SiC 웨이퍼 홀더 1650 °C 최대 서비스 온도, 높은 열 전도성, ICP 에치링을위한 플라즈마 및 경화 저항 공장

실리콘 탄화물 트레이 & SiC 웨이퍼 홀더 1650 °C 최대 서비스 온도, 높은 열 전도성, ICP 에치링을위한 플라즈마 및 경화 저항

Silicon Carbide (SiC) Trays & Plates: High-Performance Wafer Holders for ICP Etching in LED Manufacturing Silicon Carbide (SiC) trays and plates are precision-engineered wafer carriers designed specifically for Inductively Coupled Plasma (ICP) etching processes within the LED industry. SiC stands out as a superior material due to its exceptional thermal management, outstanding corrosion resistance, and remarkable mechanical stability at extreme temperatures. Key Material

품질 200mm/300mm HDPCVD 돔의 반도체 응용용 고성질 실리콘 탄화물 세라믹 부품 공장

200mm/300mm HDPCVD 돔의 반도체 응용용 고성질 실리콘 탄화물 세라믹 부품

High-Corrosion Resistance Industrial Ceramic Parts: HDPCVD Domes & Components Advanced Ceramic Solutions for Demanding Semiconductor Applications Our high-performance industrial ceramic components are engineered for extreme environments in semiconductor manufacturing, including HDPCVD (High-Density Plasma Chemical Vapor Deposition) processes. Available in multiple material options to meet specific thermal, mechanical, and corrosion resistance requirements. HDPCVD Dome

품질 산업용 알루미나 세라믹, 극도로 단단하고 극도로 높은 온도 안정성 공장

산업용 알루미나 세라믹, 극도로 단단하고 극도로 높은 온도 안정성

Alumina Ceramics: Forging a Reliable Industrial Shield with Extreme Hardness and Ultra-High Temperature Stability In the ongoing wave of modern industry advancing towards high precision, high reliability, and extreme environment applications, material selection often defines technological boundaries. Alumina (Al₂O₃) ceramics, with their near-extreme physical and chemical properties, have become a key solution for challenges involving high temperature, wear, and corrosion,

품질 고성능 세라믹 기판: 알루미나 (Al2O3), 알루미늄 나트라이드 (AlN), 실리콘 나트라이드 (Si3N4) 공장

고성능 세라믹 기판: 알루미나 (Al2O3), 알루미늄 나트라이드 (AlN), 실리콘 나트라이드 (Si3N4)

High-Performance Ceramic Substrates: Alumina (Al2O3), Aluminum Nitride (AlN), & Silicon Nitride (Si3N4) Ceramic substrates are critical components in modern electronics, providing the essential foundation for circuits while managing heat and ensuring electrical insulation. Among the most widely used materials are Alumina (Al2O3), Aluminum Nitride (AlN), and Silicon Nitride (Si3N4), each offering a unique set of properties for demanding applications. Ceramic Substrates

품질 뛰어난 열 관리, 우수한 전기 절연 및 정밀 열팽창 일치를 갖춘 질화 알루미늄 세라믹 웨이퍼 취급 암 공장

뛰어난 열 관리, 우수한 전기 절연 및 정밀 열팽창 일치를 갖춘 질화 알루미늄 세라믹 웨이퍼 취급 암

Aluminum Nitride (AlN) Ceramic Wafer Handling Arms: Complete Guide to Properties & Applications Executive Summary: Why Aluminum Nitride for Semiconductor Applications? Aluminum Nitride (AlN) represents the premier technical ceramic solution for semiconductor manufacturing equipment, particularly wafer handling arms, where the simultaneous demand for exceptional thermal management and superior electrical insulation cannot be met by conventional materials. This comprehensive

품질 고성능의 알루미늄 나이트라이드 세라믹 부품, 열전도성이 뛰어난, 열 확장을 제어할 수 있는 전기 단열성이 뛰어난 공장

고성능의 알루미늄 나이트라이드 세라믹 부품, 열전도성이 뛰어난, 열 확장을 제어할 수 있는 전기 단열성이 뛰어난

High-Performance Aluminum Nitride (AlN) Ceramic Parts for Thermal Management & Electronics Aluminum Nitride (AlN) stands alone as the premier technical ceramic material, uniquely combining exceptional thermal conductivity with superior electrical insulation properties . This rare combination makes it the ideal material solution for high-power electronics, advanced semiconductor processing, and demanding thermal management applications. Key Material Properties & Advantages

품질 정밀 연마용 9 Mohs 경도 및 고순도 0.1-0.3μm 소성 알루미나 분말 공장

정밀 연마용 9 Mohs 경도 및 고순도 0.1-0.3μm 소성 알루미나 분말

0.1-0.3µm Calcined Alumina Powder | 9 Mohs High Hardness for Precision Polishing Our Calcined Alumina Powder is engineered for precision polishing applications where surface quality is critical. With a controlled particle size of 0.1-0.3 micrometers and exceptional 9 Mohs hardness, this premium alumina powder delivers outstanding polishing performance for the most demanding industrial applications. Key Product Advantages Exceptional Hardness - 9 Mohs hardness ensures

품질 지르코니아 세라믹, 뛰어난 분쇄 강도, 높은 강도 및 경직성, 그리고 정밀 애플리케이션을 위한 좋은 열 충격 저항성 공장

지르코니아 세라믹, 뛰어난 분쇄 강도, 높은 강도 및 경직성, 그리고 정밀 애플리케이션을 위한 좋은 열 충격 저항성

Zirconia Ceramics: Breaking the Toughness Barrier, Leading Innovation in Precision Technology Applications In the field of precision engineering, the pursuit of materials often faces a contradiction where strength and toughness seem mutually exclusive. Zirconia (ZrO₂) ceramics, with their revolutionary high toughness, perfectly balance ceramic hardness with impact resistance, successfully breaking this traditional bottleneck and establishing themselves as technological

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