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Product Details:
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| Material: | SiC | Composition:SiC: | >85% |
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| Color: | Black | Density: | ≥3.65g/cm3 |
| Max. Service Temp: | 1380℃ | Flexural Strength: | 250MPa |
| Hardness: | ≥84HRA | Water Absorption: | ≤0.2% |
| Abrasion: | < 0.02% | Bending Strength: | ≥290MPa |
| Highlight: | Aluminum Oxide Ceramic Robot Arm,Aluminum Oxide Ceramic Robot Claw,Alumina Ceramic Robot Finger |
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Our high-performance ceramic robotic arms, claws, and fingers are engineered specifically for sensitive semiconductor wafer handling applications. These critical components function as the robot's "hand" - requiring exceptional thermal stability, dimensional precision, and contamination-free operation to maintain process integrity in semiconductor manufacturing environments.
Ultra-Low Contamination: Certified cleanroom-compatible materials that prevent particle generation and chemical contamination
Exceptional Thermal Stability: Maintain dimensional integrity across extreme temperature fluctuations
Superior Mechanical Properties: High stiffness-to-weight ratio for precise positioning and vibration damping
Chemical Inertness: Resistant to aggressive process chemicals including acids, bases and plasma environments
We employ diverse advanced forming processes to match your specific application requirements:
Hot Pressing: For maximum density and superior mechanical properties
Cold Isostatic Pressing (CIP): Ensuring uniform density in complex geometries
Gel Casting: Ideal for large, complex shapes with excellent surface finish
Dry Pressing: Cost-effective for high-volume production of simpler geometries
Maximum Dimensions: Up to 650mm in diameter or 4 meters in length
Porosity Levels: Engineered for very low to zero porosity depending on application
Net-Shape Sintering: Direct sintering technology minimizes post-processing
Surface Quality: Optical-grade finishes available for critical applications
Our precision ceramic manufacturing capabilities extend beyond robotic end-effectors to include:
Wafer Processing Components: Gas distribution plates, shower heads, and cover plates
Process Chamber Parts: RF windows, dome assemblies, and chamber liners
Structural Elements: Precision substrates, insulating components, and spacer rings
Specialized Fixtures: Nozzles, brackets, and custom mounting solutions
Particle-free performance during extended operational cycles
Minimal outgassing under vacuum and high-temperature conditions
Non-contaminating material composition compatible with sensitive processes
Exceptional flatness and parallelism for precise wafer positioning
Superior wear resistance for extended service life in abrasive environments
Customizable geometry with tight tolerances for direct system integration
Our ceramic components serve critical functions across semiconductor manufacturing:
Wafer transfer robots and automated material handling systems
Etch and deposition process chambers
Lithography equipment and metrology systems
Vacuum and ultra-high vacuum applications
CVD and PVD system components
With specialized expertise in advanced technical ceramics for semiconductor equipment, we provide:
Application-specific material selection guidance
Custom engineering support for unique design challenges
Rapid prototyping capabilities for development cycles
Volume manufacturing with consistent quality assurance
Technical documentation and performance validation data
Contact our engineering team to discuss your specific wafer handling requirements and discover how our precision ceramic arms, claws, and fingers can enhance your semiconductor manufacturing process reliability and yield.
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Contact Person: Ms. Yuki
Tel: 8615517781293