회사 소식 Silicon Carbide Components in Semiconductor Industry

The semiconductor industry requires materials that can maintain extreme purity, dimensional stability, and thermal reliability under demanding process conditions.

Silicon carbide (SiC) ceramics, particularly pressureless sintered silicon carbide (SSiC), are widely used due to their combination of high temperature performance, chemical resistance, and mechanical strength.

Why Silicon Carbide is Used in Semiconductor Equipment

Semiconductor manufacturing processes involve:

• High temperatures (>1000–1200°C)
• Reactive gases and chemicals
• Strict contamination control requirements

SSiC materials meet these demands through:

• High purity (SiC ≥ 98.5%)
• Near-zero porosity
• No free silicon phase
• Excellent thermal and mechanical stability

Key Material Properties

Typical SSiC properties relevant to semiconductor applications include:

• Density: ≥ 3.05 g/cm³
• Thermal conductivity: ~116 W/m·K
• Thermal expansion: ~4.0 ×10⁻⁶ /K
• Flexural strength: ≥ 380 MPa
• Maximum temperature: up to 1650°C (air)

These properties help maintain structural integrity and process consistency.

Typical SiC Components in Semiconductor Systems

1. Wafer Carriers and Boats

• Used for wafer handling in high-temperature processes
• Require dimensional stability and low thermal deformation

2. Process Tubes and Liners

• Operate in corrosive and high-temperature environments
• Require chemical resistance and purity

3. Heating Components and Susceptors

• Used in CVD and diffusion furnaces
• Require uniform heat distribution

4. Structural Supports

• Maintain alignment and positioning of wafers
• Require high stiffness and thermal stability

Performance Advantages in Semiconductor Applications

1. Thermal Stability

Low thermal expansion (~4.0 ×10⁻⁶ /K) ensures minimal deformation during heating cycles.

2. High Thermal Conductivity

Efficient heat transfer (~116 W/m·K) improves temperature uniformity.

3. Chemical Resistance

SSiC withstands exposure to reactive gases and chemical environments.

4. Dimensional Precision

• Machining tolerance: ±0.02 mm
• Surface roughness: Ra ≤ 0.8 μm

Critical for wafer alignment and process repeatability.

Comparison with Other Materials

SiC offers a balance of mechanical strength + chemical stability + thermal performance.

Challenges and Considerations

When using SiC components, consider:

• Surface finish requirements
• Particle generation control
• Process compatibility
• Cleaning and handling procedures

Proper material processing and finishing are essential for semiconductor-grade applications.

Applications Across Semiconductor Processes

SiC components are used in:

• Diffusion furnaces
• CVD processes
• Etching systems
• Thermal processing equipment

Conclusion

Silicon carbide (SSiC) plays a critical role in semiconductor manufacturing due to its:

• High temperature capability
• Chemical resistance
• Dimensional stability
• Precision machinability

These characteristics make it a preferred material for advanced semiconductor equipment.

Need Custom SiC Components for Semiconductor Applications?

Custom silicon carbide parts can be manufactured to meet:

• High purity requirements
• Tight dimensional tolerances
• Complex geometries

Providing process conditions and component requirements enables optimized design and material selection.