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High-Purity Alumina A998 (99.8%) Ceramic Rings for 200mm and 300mm Semiconductor Tools with Exceptional Plasma Resistance

Aluminum Oxide Ceramic
December 18, 2025
Category Connection: Aluminum Oxide Ceramic
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Tags:
#Alumina Catalyst Carrier #Alumina Ceramic Substrates #Alumina Ceramic
Brief: Follow along for a hands-on demonstration that highlights performance points of High-Purity Alumina A998 Ceramic Rings for semiconductor tools. This video showcases how these precision components withstand aggressive plasma environments in 200mm and 300mm etch and CVD chambers, demonstrating their exceptional plasma resistance and reliability in real-world semiconductor manufacturing applications.
Related Product Features:
  • Exceptional plasma resistance extends service life by withstanding aggressive plasma environments in etch and deposition chambers.
  • High dielectric strength provides superior electrical insulation to prevent current leakage and arcing.
  • High corrosion resistance maintains geometric integrity against halogen-based and other process gases.
  • 99.8% alumina purity minimizes metallic contamination for high-purity wafer manufacturing.
  • Excellent mechanical strength ensures structural integrity under thermal and mechanical stress.
  • Precision-engineered for 200mm and 300mm semiconductor fabrication tools with tight tolerances.
  • Compatible with major OEM platforms including etch systems, CVD/PVD systems, and plasma cleaning chambers.
  • Superior surface finishes ensure optimal plasma performance and process stability in specific toolsets.
Faqs:
  • What semiconductor tool sizes are these alumina ceramic rings compatible with?
    Our High-Purity Alumina A998 Ceramic Rings are precision-engineered for both 200mm and 300mm semiconductor fabrication tools, ensuring compatibility with major OEM platforms and process stability across different wafer sizes.
  • How does the 99.8% purity level benefit semiconductor manufacturing processes?
    The 99.8% alumina purity (A998 grade) minimizes metallic contamination, which is critical for maintaining high-purity wafer manufacturing standards and achieving optimal yield rates in sensitive semiconductor processes.
  • In which specific semiconductor applications are these ceramic rings typically used?
    These components are vital consumables in etch systems as focus rings and chamber liners, in CVD/PVD systems as collar edge rings and inserts, and in plasma cleaning chambers as durable liners that resist erosion from O₂ or NF₃ plasmas.
  • What makes these ceramic rings resistant to plasma environments?
    The exceptional plasma resistance comes from the high-purity alumina material properties, which withstand aggressive plasma environments in etch and deposition chambers, reducing particle generation and extending component service life.
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