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Product Details:
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| Material: | SiC | Composition:SiC: | >85% |
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| Color: | Black | Density: | ≥3.65g/cm3 |
| Max. Service Temp: | 1380℃ | Flexural Strength: | 250MPa |
| Hardness: | ≥84HRA | Water Absorption: | ≤0.2% |
| Abrasion: | < 0.02% | Bending Strength: | ≥290MPa |
| Highlight: | High Purity Alumina Ceramic Ring,Alumina Ceramic Focus Ring,Alumina Ceramic Edge Ring |
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Product Description
We manufacture high-performance Alumina Ceramic Rings specifically engineered for critical applications in semiconductor plasma processing equipment. Made from High-Purity Alumina A998 (99.8%), our components provide unmatched plasma resistance and reliability in demanding etch and CVD chambers.
Our ceramic ring series includes, but is not limited to:
Collar Edge Rings / Dep Rings
Focus Rings
Chamber Inserts & Liners
Other Customized Process Kit Components
These components are precision-engineered to meet the stringent requirements of 200mm and 300mm semiconductor fabrication tools, ensuring process stability and yield.
| Feature | Benefit for Your Process |
|---|---|
| Exceptional Plasma Resistance | Extends Service Life: Withstands aggressive plasma environments in etch and deposition chambers, reducing particle generation and frequency of replacement. |
| High Dielectric Strength | Superior Electrical Insulation: Preents current leakage and arcing, ensuring process stability and protecting sensitive chamber components. |
| High Corrosion Resistance | Chemically Inert: Resists corrosion from halogen-based (e.g., CF₄, Cl₂) and other process gases, maintaining geometric integrity and process consistency. |
| High Purity (A998) | Minimizes Contamination: 99.8% alumina content ensures no metallic contamination, which is critical for high-purity wafer manufacturing and high yield rates. |
| Excellent Mechanical Strength | Durable and Reliable: Maintains structural integrity under thermal and mechanical stress, ensuring long-term performance and reducing unscheduled downtime. |
Our ceramic rings are vital consumables and components within plasma chambers:
Etch Systems: Used as Focus Rings and Chamber Liners in Dielectric and Conductor Etch tools to precisely control plasma density and protect chamber walls.
CVD/PVD Systems: Serve as Collar Edge Rings and Inserts to define the processing environment and prevent unwanted deposition.
Plasma Cleaning Chambers: Act as durable Liners that resist erosion from O₂ or NF₃ plasmas, extending maintenance cycles.
Manufactured for Precision: We specialize in producing components with tight tolerances and superior surface finishes, ensuring a perfect fit and optimal plasma performance in your specific toolset.
Designed for Performance: Our focus on material science and engineering results in parts that deliver longer service life, reduced particle counts, and improved process repeatability.
Compatible with Major Platforms: Our products are designed for use in a wide range of 200mm and 300mm semiconductor equipment from leading OEMs.
Looking for a reliable partner for your semiconductor ceramic components? Contact us today for technical specifications, pricing, and to discuss custom solutions for your application.
Contact Person: Ms. Yuki
Tel: 8615517781293