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High-Purity Alumina A998 (99.8%) Ceramic Rings for 200mm and 300mm Semiconductor Tools with Exceptional Plasma Resistance

Basic Properties
Place of Origin: China
Brand Name: KEGU
Model Number: Customizable
Trading Properties
Price: 200-500 yuan/kg
Payment Terms: L/C,D/A,D/P,T/T,Western Union,MoneyGram
Supply Ability: 2,000 pcs/month
Product Summary
Advanced Alumina Ceramic Rings for Semiconductor Equipment We manufacture high-performance Alumina Ceramic Rings specifically engineered for critical applications in semiconductor plasma processing equipment. Made from High-Purity Alumina A998 (99.8%), our components provide unmatched plasma ...

Product Details

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High Purity Alumina Ceramic Ring

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Alumina Ceramic Focus Ring

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Alumina Ceramic Edge Ring

Material: SiC
Composition:SiC: >85%
Color: Black
Density: ≥3.65g/cm3
Max. Service Temp: 1380℃
Flexural Strength: 250MPa
Hardness: ≥84HRA
Water Absorption: ≤0.2%
Abrasion: < 0.02%
Bending Strength: ≥290MPa
Product Description
Advanced Alumina Ceramic Rings for Semiconductor Equipment
We manufacture high-performance Alumina Ceramic Rings specifically engineered for critical applications in semiconductor plasma processing equipment. Made from High-Purity Alumina A998 (99.8%), our components provide unmatched plasma resistance and reliability in demanding etch and CVD chambers.
Product Overview
  • Collar Edge Rings / Dep Rings
  • Focus Rings
  • Chamber Inserts & Liners
  • Other Customized Process Kit Components
These components are precision-engineered to meet the stringent requirements of 200mm and 300mm semiconductor fabrication tools, ensuring process stability and yield.
Key Material Properties & Advantages
Feature Benefit for Your Process
Exceptional Plasma Resistance Extends Service Life: Withstands aggressive plasma environments in etch and deposition chambers, reducing particle generation and frequency of replacement.
High Dielectric Strength Superior Electrical Insulation: Prevents current leakage and arcing, ensuring process stability and protecting sensitive chamber components.
High Corrosion Resistance Chemically Inert: Resists corrosion from halogen-based (e.g., CF₄, Cl₂) and other process gases, maintaining geometric integrity and process consistency.
High Purity (A998) Minimizes Contamination: 99.8% alumina content ensures no metallic contamination, which is critical for high-purity wafer manufacturing and high yield rates.
Excellent Mechanical Strength Durable and Reliable: Maintains structural integrity under thermal and mechanical stress, ensuring long-term performance and reducing unscheduled downtime.
Primary Applications in Semiconductor Manufacturing
Our ceramic rings are vital consumables and components within plasma chambers:
  • Etch Systems: Used as Focus Rings and Chamber Liners in Dielectric and Conductor Etch tools to precisely control plasma density and protect chamber walls.
  • CVD/PVD Systems: Serve as Collar Edge Rings and Inserts to define the processing environment and prevent unwanted deposition.
  • Plasma Cleaning Chambers: Act as durable Liners that resist erosion from O₂ or NF₃ plasmas, extending maintenance cycles.
Why Choose Our Alumina Ceramic Rings?
  • Manufactured for Precision: We specialize in producing components with tight tolerances and superior surface finishes, ensuring a perfect fit and optimal plasma performance in your specific toolset.
  • Designed for Performance: Our focus on material science and engineering results in parts that deliver longer service life, reduced particle counts, and improved process repeatability.
  • Compatible with Major Platforms: Our products are designed for use in a wide range of 200mm and 300mm semiconductor equipment from leading OEMs.
Looking for a reliable partner for your semiconductor ceramic components? Contact us today for technical specifications, pricing, and to discuss custom solutions for your application.
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