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High-Corrosion Resistance Silicon Carbide Ceramic Components for Semiconductor Applications in 200mm/300mm HDPCVD Domes

Basic Properties
Place of Origin: China
Brand Name: KEGU
Model Number: Customizable
Trading Properties
Minimum Order Quantity: Negotiable
Price: Negotiable
Payment Terms: L/C,D/A,D/P,T/T,Western Union,MoneyGram
Product Summary
High-Corrosion Resistance Industrial Ceramic Parts: HDPCVD Domes & Components Advanced Ceramic Solutions for Demanding Semiconductor Applications Our high-performance industrial ceramic components are engineered for extreme environments in semiconductor manufacturing, including HDPCVD (High-Density ...

Product Details

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High-Corrosion Resistance Silicon Carbide Ceramic Components

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Semiconductor Applications HDPCVD Dome

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200mm/300mm Configurations Industrial Ceramic Parts

Usage: Industry Usage
Chemical Composition: Al2O3, SiO2
Sic Content: 85%
Maximum Temperature: 1600℃
Characteristics: High Wear Resistance
Thermal Expansion Coefficient: 4.0-4.5 × 10^-6 /K
Material Composition: 4%Si >96%Sic
Working Temperature: 1650
Advantage: Wear And Abrasion Resistance
Purity: 98%
Material: Silicon Carbide Ceramic
Acid Alkaline Proof: Excellent
Solubility: Insoluble
Open Porosity: <0.1%
Flexural Strength: 350-550 MPa
Product Description
High-Corrosion Resistance Industrial Ceramic Parts: HDPCVD Domes & Components
Advanced Ceramic Solutions for Demanding Semiconductor Applications
Our high-performance industrial ceramic components are engineered for extreme environments in semiconductor manufacturing, including HDPCVD (High-Density Plasma Chemical Vapor Deposition) processes. Available in multiple material options to meet specific thermal, mechanical, and corrosion resistance requirements.
HDPCVD Dome Products
Available Types & Specifications:
  • Standard HDP Dome: 200mm / 300mm configurations
  • SpeedDome: Optimized for high-throughput processes
  • DPS Dome: Enhanced plasma resistance designs
  • Custom Roughness: Inner contour surface finish from Ra 0.5 to Ra 5.3
  • Key Benefits: Prevents film shedding, minimizes particle contamination, compatible with various process requirements
Material Selection Guide
Property Alumina (Al₂O₃) Aluminum Nitride (AlN) Zirconia (ZrO₂) Silicon Carbide (SiC) Sapphire (Single Crystal Al₂O₃)
Density (g/cm³) 3.9 3.3 6.0 3.21 3.97
Hardness (GPa) 14-17 10-12 13 27-28 22.5
Elastic Modulus (GPa) 350-400 300-350 200-250 420-470 440-690
Fracture Toughness (MPa*m¹/²) 3-4 2.8-3.3 10-11 3.5-3.6 2.6
Thermal Conductivity (W/m*K) 28-32 180-200 2-3 160-200 40
Thermal Shock Resistance 200-280°C Excellent 300°C Excellent 800°C
Dielectric Constant (1MHz) 9.8 8.5-9 30-33 Conductive 9.3
Volume Resistivity (Ω*cm) >10¹⁴ >10¹⁴ Adjustable Varies >10¹⁴
Key Material Advantages
Alumina (Al₂O₃)
  • Excellent chemical stability and corrosion resistance
  • High hardness and wear resistance
  • Ideal for wear components, insulating substrates, corrosion-resistant containers
Aluminum Nitride (AlN)
  • Superior thermal conductivity for heat dissipation
  • Excellent electrical insulation properties
  • Perfect for electronic heat sinks, high-power device packaging
Zirconia (ZrO₂)
  • Exceptional fracture toughness
  • Transformation toughening mechanism
  • Suitable for cutting tools, oxygen sensors, fuel cells
Silicon Carbide (SiC)
  • Extreme hardness and thermal conductivity
  • Excellent for ballistic armor, high-temperature bearings, semiconductor components
Sapphire (Single Crystal Al₂O₃)
  • Optical transparency combined with high hardness
  • Superior thermal shock resistance
  • Ideal for specialized optical and extreme environment applications
Performance Features
  • Superior Corrosion Resistance: Withstands aggressive chemical environments in semiconductor processing
  • Minimal Particle Generation: Engineered surfaces reduce contamination in cleanroom environments
  • Customizable Surface Properties: Tailored roughness and finishing to meet specific process requirements
  • Thermal Stability: Maintains dimensional integrity under rapid thermal cycling
  • Electrical Insulation: Excellent dielectric properties for plasma applications
Applications
  • Semiconductor Processing: HDPCVD chambers, etch components, plasma environments
  • Electronic Packaging: Heat spreaders, insulating substrates
  • Industrial Components: Wear-resistant parts, corrosion-resistant containers
  • Advanced Research: Specialized laboratory equipment, optical components
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